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High Performance Polymers
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Photocuring Reaction of Poly(Glycidyl Methacrylate-Co-N,N'-Dimethyl Acrylamide) using Photogenerated Amine from Bis(4-Formyl Aminophenyl ) Methane for Photoresist Applications

Abdel-Ghaffar El-Demerdash

Alexandria University, Institute of Graduate Studies & Research, Materials Science Department, 163 Horreya Avenue, Shatby 21526- Egypt, eldemerd{at}yahoo.co.uk

Photo initiated cross linking of epoxides is very promising from the viewpoint of application to photocurable coating and photoresist. Although amines are known to be useful as crosslinkers for epoxides, only a few studies on the photoinitiated formation of amines are reported. This work describes the synthesis and characterization of copolymer comprised of one sort of material to induce water solubility such as N,N '-dimethyl acrylamide (DMAC); and another material to give the photoactive response such as glycidyl methacrylate (GMA). Various copolymers were prepared by free-radical solution polymerization typically in chloroform and azobisisobutyronitrile (AIBN) as initiator at 60—63°C. Photocrosslinking reaction was induced using bis (4-formylaminophenyl) methane (FAPM) as a photobase generator. It was found that poor image pattern profile has been obtained after exposure to UV radiation with {lambda} max = 250 and 420 nm.

Key Words: Photobase generator • glycidyl methacrylate copolymers • photoresist • water soluble • lithography

References

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  • Tsunooka, M.; Sashio, M.; Nishimura, M.; and Ito, K.I. (1994). Thermal crosslinking of poly(Glycidyl methacrylate) film and epoxy resin films using amines formed by photolysis of acyloximes, J.Polym., Sci., PartA : Polym. Chem., 32: 1793—1796 .[CrossRef]
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  • Davidson, K., and Hadly, C., (1994). Novel Photoresist Employing Onium Salts Photoinitiator , In Proceedings of the 10th International Conference on Pphotopolymers, UAS, pp. 136—145.
  • Davidson, K., Attawy, S., El-Gamal, M., Khattab, M., and El-Demerdash, A. (2002). Synthesis of New Polymers for Photoresist and Lithographic Printing Applications, High Perform . Polym., 14: 3—15 .
  • Kyu, H. (1998). Thermal Curing Reaction of Poly(Glycidyl) Methacrylate Using Photogenerated Amines from Oxime—Urethane Derivatives, Macromol . Rapid Commun., 19: 1—4 .[CrossRef]
  • Brainard, R., Barclay, G., Anderson, E., and Ocola, L. (2002). Resists for Next Generation Lithography , Microelectron. Engng, 61: 707—715 .[CrossRef]

This version was published on August 1, 2007

High Performance Polymers, Vol. 19, No. 4, 371-381 (2007)
DOI: 10.1177/0954008307077557
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This Article
Right arrow Abstract Freely available
Right arrow Free Full Text (Free PDF) Free
Right arrow Alert me when this article is cited
Right arrow Alert me if a correction is posted
Services
Right arrow Email this article to a friend
Right arrow Similar articles in this journal
Right arrow Similar articles in Web of Science
Right arrow Alert me to new issues of the journal
Right arrow Add to Saved Citations
Right arrow Download to citation manager
Right arrowRequest Permissions
Right arrow Request Reprints
Right arrow Add to My Marked Citations
Citing Articles
Right arrow Citing Articles via Google Scholar
Right arrow Citing Articles via Scopus
Google Scholar
Right arrow Articles by El-Demerdash, A.-G.
Right arrow Search for Related Content
Social Bookmarking
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What's this?