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High Performance Polymers
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Nanotribological Properties of Poly(ether ketone ketone) (PEKK) and Sulfonated Poly(ether ketone ketone) (S-PEKK) Thin Films

Caisheng Song

Yiwang Chen

Department of Chemistry, Jiangxi Normal University, Jiangxi 330027, People's Republic of China

Daoji Gan

Department of Chemistry, Jiangxi Normal University, Jiangxi 330027, People's Republic of China;School of Chemistry and Biochemistry, Georgia Institute of Technology, 770 state Street, Atlanta, GA 30332, USADaoJi.Ganchemistry.gatech.edu

Zhijian Wang

Laboratory of Materials, Chinese Academy of Sciences, Beiing 100080, People's Republic of China

An atomic force microscope (AFM) was used to determine the nanotribological properties of poly(ether ketone ketone) (PEKK) and sulfonated poly(ether ketone ketone) (S-PEKK) thin films, by sliding the AFM tip on the polymer surfaces and stepwise increasing the loading forces on the cantilever. For comparison, a polystyrene (PS) film with surface roughness comparable to those of the PEKK and S-PEKK was also examined using the same procedure. It was found that the S-PEKK film exhibits much higher values of both the coefficient of friction and the adhesive force than the PEKK film, which exhibits slightly higher values than the PS film. The surface topographies of the polymer films captured after frictional measurements suggest that PEKK has much better wear resistance than PS, whereas S-PEKK displays some visco-elastic character.

High Performance Polymers, Vol. 14, No. 2, 183-194 (2002)
DOI: 10.1177/095400830201400107
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